Very large purity silicon for semiconductors is acquired using the Siemens method; the silicon is reacted to create trichlorosilane, which happens to be first purified by distillation, then reacted with purified hydrogen on high purity silicon rods at 1150 oC to yield high purity, polycrystalline silicon with hydrochloric acid byproduct. https://glasslinedcastironpipe48258.blogs100.com/37121627/5-simple-techniques-for-sic-abrasive